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Cymer, LLC., an ASML company, is an American company headquartered in San Diego, California. Cymer is the largest supplier of deep ultraviolet (DUV) light sources used by chipmakers to pattern advanced semiconductor chips or integrated circuits. Cymer is currently developing next-generation laser-produced plasma extreme ultraviolet (EUV) light sources. As of October 2012, it was announced that Cymer would be acquired by Dutch semiconductor equipment manufacturer ASML. The acquisition closed in May 2013.〔http://www.utsandiego.com/news/2013/May/30/Cymer-completes-merger-with-ASML/〕 ==Corporate History== Cymer was founded in 1986 by Dr. Robert Akins and Dr. Richard Sandstrom, who met in the mid-1970s in a lab class at the University of California, San Diego. In 1986, the personal computer market opened a door for Akins and Sandstrom to apply their unique laser knowledge for the purpose of semiconductor photolithography. In 1988, Cymer shipped its first light source for advanced research and development applications to support the development of semiconductor lithography. In 1990, a second-generation light source shipped, and the company quickly progressed, shipping a total of 78 light source systems between 1988 and 1994. In the mid-1990s, Cymer had established its light sources as a necessary component in the development of advanced semiconductor products, and demand for its light sources began to increase. To meet this demand, Cymer issued its initial public offering on the NASDAQ in September 1996 under the symbol CYMI. The company’s IPO helped provide the capital Cymer needed to grow manufacturing capacity and service infrastructure as needed to meet the industry’s rapid expansion. In the dot-com boom of 2000, Cymer sold an annual high of 494 new light source systems, and in 2002 the company shipped its 2000th light source. By the end of the decade, Cymer had shipped more than 3,300 KrF (248 nm) and ArF (193 nm) and ArF Immersion light sources world-wide. In June 2009, Cymer shipped the world’s first fully integrated LPP (laser produced plasma) EUV lithography light source to ASML Holding in Veldhoven, Netherlands, for integration into its EUV scanner.〔Shenkenberg, David, Photonics Spectra, October 2009, Taking Semiconductor Manufacturing to the Extreme (online: http://www.photonics.com/Article.aspx?AID=40103)〕 This new type of light source produces a wavelength of 13.5 nm and will be used to pattern chips for at least the next decade.〔Intel Achieves Major Milestones in EUV Lithography Program (online: http://www.intel.com/pressroom/archive/releases/2004/20040802tech.htm)〕 In July 2005, TCZ was formed as a joint venture between Cymer, Inc. and Carl Zeiss SMT AG to develop and manufacture a silicon crystallization process tool for use in the production of flat panel displays and OLED displays. The crystallization tool uses Cymer's light source technology. In January 2010, Cymer announced that it would acquire Carl Zeiss' ownership interest in the Cymer/Zeiss TCZ joint venture, making TCZ a wholly owned Cymer company. In October 2012, Cymer announced it was discontinuing its TCZ business. In October 2012, Dutch semiconductor equipment manufacturer ASML announced that it would acquire Cymer, as part of their EUV equipment strategy. The acquisition closed in May 2013.〔http://www.utsandiego.com/news/2013/May/30/Cymer-completes-merger-with-ASML/〕 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Cymer, Inc.」の詳細全文を読む スポンサード リンク
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